METHOD FOR PRODUCTION OF SILICON DIOXIDE Russian patent published in 1995 - IPC

Abstract RU 2036836 C1

FIELD: production process of amorphous silicon dioxide. SUBSTANCE: silicon-containing material is used in form of dust of flue gases of production of silicon and/or high-silicon ferrosilicon. Dust is treated with alkaline solution. Silicon dioxide is separated from obtained solution by action of mineral acid. EFFECT: higher efficiency. 2 dwg

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RU 2 036 836 C1

Authors

Evseev N.V.

Chernjakhovskij L.V.

Radchenko N.F.

Dates

1995-06-09Published

1992-11-10Filed