FIELD: optical instrument making. SUBSTANCE: two telescopic systems 2, corresponding to subapertures of the system, receives a light irradiation 1 from an object, being viewed. Each light subflow is being passed through the unit 3 of changeable photofilters. Then the light flows are being passed through the device 4 for changing stroke differences, and with the aid of flat mirror system 6 and the focusing lens 7 the light flows are being summed in a focusing plane of the device for measuring visibility distribution. By changing an orientation of the flat mirrors 6 a change of an interval of separation of optical beams from the subaperture of the system in the focusing plane is being taken into account. EFFECT: enhanced accuracy of phasing. 1 cl, 1 dwg
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Authors
Dates
1995-06-27—Published
1988-12-22—Filed