DRY FILM PHOTORESIST Russian patent published in 1996 - IPC

FIELD: printed array making. SUBSTANCE: dry film photoresist consisting of polyethyleneterephthalate base, stained photosensitive layer protected with polyethylene film has polymeric binder which is soluble in methylchloroform 54.56-58.56 wt. -%, cross-linking monomers - esters of polyatomic alcohols and acrylic or methacrylic acids 30.92-38.56 wt.-%, photoinitiating agents 3.06-5.06 wt. -%, inhibitors 0.44-0.54 wt.-%, dyes 0.08-1.15 wt.-%. Styrene copolymer with acrylonitrile of azeotropic composition or its mixture with polymethylmethacrylate (1:1) is used as polymeric binder and allows to obtain dry film photoresist showing resolving power up to 75 mcm, adhesion and chemical resistance that 1.5-2-fold more than in the known photoresists. EFFECT: improved properties of photoresist. 1 tbl