FIELD: electronics. SUBSTANCE: process of metallizing of dielectrics, predominantly polyimide film, includes deposition of layer of chemical nickel 1.0-2.0 μ thick on it from acidic solution, treatment of deposited layer in 5% solution of nitrogen acidic copper and chemical deposition of copper coat in alkali solution. EFFECT: increased productivity of process. 1 tbl
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PROCESS OF PREPARATION OF COMBINED COPPER-POLYIMIDE SURFACE TO FORMATION OF COATING BY CHEMICAL CONVERSION | 1992 |
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AQUEOUS SOLUTION FOR CHEMICAL COPPER PLATING | 0 |
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CONTACT-CHEMICAL METHOD FOR METAL DEPOSITION | 0 |
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METHOD OF MANUFACTURING FLEXIBLE MICROPRINTED BOARD | 2012 |
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METHOD OF ELECTROLYTICAL MOULDING OF ARTICLES | 0 |
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CUPRIC SALTS OF ALIPHATIC FLUOROCARBOXALIC ACIDS POSSESSING PHOTOCHEMICAL ACTIVITY IN PROCESSES OF PHOTOSELECTIVE METALLIZATION OF DIELECTRICS | 0 |
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ELECTROLYTE AND METHOD OF COPPER SEDIMENTATION ON THIN CONDUCTIVE SUBLAYER ON SURFACE OF SILICIC PLATES | 2012 |
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Authors
Dates
1996-05-27—Published
1990-05-14—Filed