FIELD: purification of metal, semiconductor and dielectric surfaces. SUBSTANCE: proposed composition contains (mass %): fraction of polyethyl benzenes 1-10, toluene-xylene fraction 1-5, paraffins of C5-C12 fraction 3-5, petroleum solvent up to 100 and preferably antistatic additive 0.00001-0.001. EFFECT: improves purification. 2 cl, 2 tbl
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Authors
Dates
1997-03-27—Published
1995-03-23—Filed