FIELD: inorganic chemistry and technology. SUBSTANCE: method involves preparing the mixture consisting of magnesium, silicon, silicon dioxide and/or magnesium perchlorate followed by thermic treatment at SVS regime under inert gas pressure, mainly, argon - 0.5-2.0 MPa at the following ratio of components, wt.-%: magnesium 60-63; silicon 2.0-36, and silicon dioxide and/or magnesium perchlorate - the rest. Silicon dioxide is taken at ratio 14-37 wt. -% and magnesium perchlorate - 2.0-5.0 wt.-%. The obtained magnesium silicide is used as raw for monosilane production. EFFECT: improved method of production. 2 cl, 1 tbl
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Authors
Dates
1997-07-10—Published
1995-04-13—Filed