PROCESS OF GENERATION OF PLASMA Russian patent published in 1997 - IPC

FIELD: generation of plasma for fragment-free perforation of standard obstacles. SUBSTANCE: process of generation of plasma consists in simultaneous initiation of condensed charge of explosive over perimeter of its section normal to symmetry axis with subsequent divergence of detonation products in axially symmetric chamber with narrowing section towards its outlet. Jet of plasma additionally includes compressed inert substance placed in thin layer on surface of charge facing chamber at starting moment. EFFECT: increased efficiency of process. 1 dwg