INDUCTION FURNACE, APPARATUS FOR USING SAID FURNACE, METHOD FOR HEAT TREATMENT OF SYNTHETIC SILICON DIOXIDE MASSES AND METHODS FOR PRODUCING SILICON DIOXIDE GLASS Russian patent published in 1998 - IPC

FIELD: non-ferrous metallurgy; production of synthetic silicon dioxide for subsequent use in glass making. SUBSTANCE: induction furnace comprises tubular susceptor aligned in such manner that its axis extends vertically, and induction coil intended to raise temperature of susceptor. The latter is made of graphite and/or silicon carbide and housed by vacuum-tight shell made of vitreous silicon dioxide or fused quartz, and said shell is embraced by induction coil which is cooled by cooling liquid. Structural design of furnace is such as to enable vacuum-tight shell to operate at temperatures that are lower than temperatures capable to provoke either devitrification or sagging of shell even under circumferences when tubular susceptor is heated up to 1700 C. So that sintering of porous synthetic silicon dioxide mass can be conducted either under atmospheric or reduced pressure. Furnace comprises shaft adapted to serve as support for mass to be heated, and capable to revolve around vertical axis or to travel along axis of tubular susceptor. EFFECT: production of high-purity synthetic silicon dioxide. 10 cl, 4 dwg