METHOD OF FABRICATING PRODUCTS OF SILICON DIOXIDE Russian patent published in 1998 - IPC

Abstract RU 2118299 C1

FIELD: glass making. SUBSTANCE: invention is intended for large-scale fabrication of interstice-free glass with high silicon dioxide content. Method consists in gelling aqueous sole of silicon dioxide colloidal particles followed by drying and baking resultant gel. Lack of breaks in dried gel is caused by adding polymer product wetting particles. This product is removed by thermal decomposition when baking product at high temperatures. EFFECT: improved workability of glass product. 22 cl, 5 dwg

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RU 2 118 299 C1

Authors

Ehdvin Artur Chehndros

Debra Ehnn Fleming

Dehvid Vilfred Dzhonson

Dzhon Burnett Makchesni

Frederik V.Volz

Dates

1998-08-27Published

1993-08-06Filed