ION SOURCE WITH PERIPHERAL MAGNETIC FIELD Russian patent published in 1998 - IPC

Abstract RU 2114482 C1

FIELD: ion engineering. SUBSTANCE: ion source has ionizing chamber with extraction aperture, plasma electrode, magnets producing peripheral organization, multiple magnetic field; cathodes are placed past magnetic poles relative to central longitudinal axis of source. EFFECT: provision for separating high-energy electrons from beam shaping zone; reduced temperature of ions in plasma wherefrom ion beam is extracted. 2 dwg

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RU 2 114 482 C1

Authors

Kolomiets A.A.

Turchin V.I.

Khromov A.A.

Dates

1998-06-27Published

1994-04-12Filed