FIELD: physics.
SUBSTANCE: invention refers to the sources of gas ions, which are used in accelerators of charged particles. Duopolasmatron source of gas ions consists of the coaxially located cathode, of the intermediate electrode with the opening and of the anode with the emission opening. There is the tubular metal cylinder between the anode and the intermediate electrode, one end of the cylinder is fixed to the intermediate electrode, and the opposite end is blocked by the diaphragm with the opening, the area of which is selected to be less than the inner surface area of the tubular metal cylinder, this area is selected as the ratio of the square root of the doubled electron mass to the square root of the working gas ion.
EFFECT: increased phase current density of the injected ion beam.
1 cl, 1 dwg
| Title | Year | Author | Number |
|---|---|---|---|
| ION SOURCE WITH EFFECT OF HOLLOW CATHODE | 2002 |
|
RU2231163C2 |
| DUOPLASMATRON | 1992 |
|
RU2045103C1 |
| SOURCE OF IONS WITH MULTIPOLE MAGNETIC FIELD IN HOLLOW CATHODE | 2007 |
|
RU2352013C2 |
| COMPOSITE DOUBLE-STAGE ELECTRICAL DISCHARGE ION SOURCE | 2003 |
|
RU2248641C1 |
| MULTICASP SOURCE OF IONS WITH DOUBLE-STAGE ELECTRIC DISCHARGE | 2001 |
|
RU2214016C2 |
| PLASMA ION EMITTER | 1998 |
|
RU2150156C1 |
| DUOPLASMATRON WITH LOW OUTPUT GAS FLOW | 1999 |
|
RU2170988C2 |
| SOURCE OF IONS OF GASES | 1988 |
|
SU1625254A3 |
| PLASMA ELECTRON SOURCE | 0 |
|
SU1048956A1 |
| PLASMA ELECTRON SOURCE | 2002 |
|
RU2208871C1 |
