FIELD: examination of parameters of thin dielectric films. SUBSTANCE: method includes formation of optical contact area between waveguide surface and coupling element made of two or more interconnected parts insulated optically from each other. Method also includes removal of radiation from waveguide, measurement of angular distribution of intensity of radiation passed through waveguide, and calculation of waveguide parameters by angular distribution. EFFECT: enhanced accuracy of measurements. 1 dwg
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Authors
Dates
1998-10-10—Published
1990-10-29—Filed