ION-BEAM MICROPROJECTOR AND ITS ADJUSTMENT PROCESS Russian patent published in 1999 - IPC

FIELD: electronic engineering; large-capacity integrated circuits manufactured by lithographic method. SUBSTANCE: divergence of ion beam produced by ion-beam generator is varied during microprojector adjustment in metrological template plane by varying supply voltage across electrostatic lens of illuminating device incorporated in optical system of microprojector; in the process, circumferential distortion is measured on working field of target incorporated in receiving unit; when circumference with zero- distortion radius is detected, distortion on circumference with r_m = 3/5 radius is measured and measurement results are used to determine adjustment of microprojector with respect to permissible distortion. EFFECT: improved quality of image due to reduced aberrations brought in by illuminating device. 2 cl, 8 dwg