LOADING-UNLOADING DEVICE FOR SEMICONDUCTOR PLATES FOR ION IMPLANTATION ASSEMBLY Russian patent published in 1999 - IPC

Abstract RU 2126191 C1

FIELD: ion implantation equipment. SUBSTANCE: device has stage 28 which has surface for plate loading, scanning and sloping unit 26, which works by rotating said stage about axis 52, which is parallel to plane defined by surface of plate 78, which is loaded onto said stage. It works by movement of said stage in scanning direction along straight line which is perpendicular to said axis. Scanning and sloping unit has first lever for rotation about said axis, second lever which is mounted on first lever for relative rotation about it, third lever, which is mounted on second lever for relative rotation about it. Said stage is mounted on third lever. In addition device has first driving unit (34, 54, 56) which is designed for rotation of first lever about said axis, units which are connected to first, second and third levers, which are designed for movement of said stage in scanning direction. In addition device has second driving unit, which is designed for rotation of first, second and third levers as integral unit about said axis, and unit 110, which connects second driving unit and third lever to keep rotating position of third lever. Said unit which connects second driving unit and third lever has linear bearing unit, which has first guiding unit, which has two extended guides, which are mounted in fixed position with respect to second driving unit. In addition device has sliding carriage unit, which has bearing support, which is mounted for interaction with guides which are mounted in fixed position with respect to third lever. EFFECT: elimination of belt transmission in plate scanning mechanism. 3 cl, 4 dwg

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RU 2 126 191 C1

Authors

Robert Allen Brjun

Ehndrju Marlou Rehj

Dates

1999-02-10Published

1994-12-20Filed