FIELD: plasma technologies. SUBSTANCE: invention is intended for use when thermally treating and rendering spheroid powdered refractory materials. Material is introduced into high- temperature zone of plasma stream abutting on outer side of plasmotron exit, from the cross-section of which, uniform velocity and heat stream is formed. Material is introduced into stream zone at an angle to its axis. Apparatus comprises plasmotron discharge chamber, gas- distribution element, and material feeder. The element is constructed as a cooled insertion placed in discharge chamber entry and forming annular channel with the chamber. Feeder is installed such as to feed material into stream zone abutting on outer side of plasmotron exit. EFFECT: increased productivity and improved product quality. 9 cl, 1 dwg
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