FIELD: plasma processing of materials.
SUBSTANCE: method includes forming plasmatron of stable pressure and flow of working gas and feeding of material into area of balanced plasma, material flow of balanced mass flow is fed perpendicularly to plasma flow at speed, close to speed of free fall of body, with width of material flow no more than width of plasma flow zone and with thickness no more than three average diameters of particles. Method for forming a flow of low-disperse powder-like material includes dosage of source material, feeding thereof in self-propelled manner, previous and finishing displacement, during dosage pulsation of flow is softened, at stage of prior mixing flow coming from dosing device is divided on flows even in terms of mass flow, then with each of them at least two serial cycles are performed, in each of which flow of material is additionally divided on two sub-flows, moving with different speeds along zigzag-like asymmetric trajectories, and then these sub-slows are united, with end of last cycle direction of united flow is changed, and at stage of finishing movement interaction of separated flows is provided for in such a way, that horizontal components of their movement vectors are mutually compensated.
EFFECT: higher efficiency, broader functional capabilities, lower costs.
2 cl, 2 dwg
