METHOD FOR MANUFACTURING OF GAS-DISCHARGE ALTERNATING CURRENT INDICATION BOARD Russian patent published in 1999 - IPC

Abstract RU 2132582 C1

FIELD: gas-discharge equipment. SUBSTANCE: method involves preceding heat processing under exhausting temperature of 330-400 C with heat processing under 150-400 C and coating cover with gas discharge in noble gas with pumping operations, which are performed after or during processing. EFFECT: decreased discharge excitation voltage due to increased quality of purification.

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RU 2 132 582 C1

Authors

Ivljushkin A.N.

Levina N.N.

Samorodov V.G.

Dates

1999-06-27—Published

1998-07-02—Filed