FIELD: treatment of microstructures; production of microelectronic devices. SUBSTANCE: neutral atomic beam is generated by optical-range laser beam in three stages: 1. Atoms are cooled down in interference nodes of three-dimensional standing wave moving in parallel with beam axis at speed v. 2. Atoms are brought to resonance-tuned interaction in vacuum with field of standing wave of light, field of traveling wave of cooling light, and field of light traveling wave at preset crosswise distribution of intensity. 3. Atoms cooled down by concurrent beams are accelerated to working speed v1 along converging lines of minimums of concurrent radiation interference pattern. Upon exit from resonance and radiation conditions, atoms reach surface being treated by inertia. Device implementing this method has neutral atom source, optomagnetic separator, coherent light source, mirrors with holes, mirror axicons. EFFECT: improved contrast and sharpness of image applied to microelectronic device. 6 cl, 8 dwg
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Authors
Dates
1999-07-10—Published
1998-04-21—Filed