ELECTROLYTE FOR DEPOSITION OF COPPER-INDIUM ALLOY Russian patent published in 1999 - IPC

Abstract RU 2134734 C1

FIELD: electrolysises for electrodeposition of copper-indium alloy. SUBSTANCE: electrolyte for deposition of coatings from copper-indium alloy has copper and indium sulfates, trilon B, ammonium acetate and organic additive with definite amounts of components. Electrolyte allows deposition of light, semilustrous coatings with high corrosion resistance. EFFECT: higher efficiency. 1 tbl

Similar patents RU2134734C1

Title	Year	Author	Number
ELECTROLYTE FOR DEPOSITING COPPER-COBALT ALLOY	1996	Povetkin V.V. Devjatkova O.V.	RU2101395C1
ELECTROLYTE FOR DEPOSITING COPPER-NICKEL ALLOY	1996	Povetkin V.V. Devjatkova O.V.	RU2106436C1
ZINC-PLUMBUM ALLOY DEPOSITION ELECTROLYTE	1997	Povetkin V.V. Danchuk L.N.	RU2118671C1
ELECTROLYTE FOR DEPOSITION OF ZINC-ANTIMONY ALLOY	1999	Povetkin V.V. Danchuk L.N.	RU2156324C1
BISMUTH-TIN ALLY PRECIPITATION ELECTROLYTE	1999	Povetkin V.V.	RU2164967C1
ELECTROLYTE FOR DEPOSITION OF COPPER-CADMIUM ALLOY	1998	Povetkin V.V. Ivanova T.E. Vedernikova A.V.	RU2135645C1
ELECTROLYTE FOR PRECIPITATION OF COBALT-BISMUTH ALLOY	2001	Povetkin V.V. Skifskij S.V.	RU2197567C1
ELECTROLYTE FOR DEPOSITING BISMUTH-LEAD ALLOY	1996	Povetkin V.V. Devjatkova O.V. Danchuk L.N.	RU2105830C1
ELECTROLYTE FOR DEPOSITING BISMUTH-CADMIUM ALLOY	1998	Povetkin V.V. Ivanova T.E.	RU2139370C1
ELECTROLYTE FOR DEPOSITION OF BISMUTH-MANGANESE ALLOY	1997	Povetkin V.V. Shibleva T.G.	RU2116389C1

RU 2 134 734 C1

Authors

Povetkin V.V.

Ivanova T.E.

Vedernikova A.V.

Dates

1999-08-20—Published

1998-06-02—Filed