DEVICE FOR GAS CLEANING Russian patent published in 1999 - IPC

FIELD: cleaning of stack gases , air, sanitary and ventilation device from finely dispersed solid and liquid phases and harmful impurities. SUBSTANCE: device for gas cleaning has case with electrode mounted axially symmetric, branch pipes to feed and drain liquid and gas. Electrode is manufactured in the form of vessel made fast to branch pipe feeding liquid in which side wall nozzles to spray liquid are arranged in staggered order. Invention makes it feasible to enhance degree of cleaning of gas from small particles and molecules of impurities thanks to increased surface of contact of charged drops of liquid with ionized flow of gas. EFFECT: enhanced degree of cleaning of gas. 1 dwg