METHOD OF PRODUCING RARE REFRACTORY METALS, SILICON AND THEIR COMPOUNDS Russian patent published in 2000 - IPC

FIELD: metallurgy. SUBSTANCE: method is based on plasmo-chemical reaction of gaseous compounds and consists in reduction or decomposition of gaseous compounds of metals and silicon in presence of reagents in zone of low-temperature thermo-nonequilibrium plasma with additional introduction into reaction zone of combustible mixture, for instance, hydrogen and oxygen and activation of gaseous reagents by ultraviolet radiation with use of source of low-temperature thermo-nonequilibrium plasma and ultraviolet radiation in the form of element with creeping discharge located inside reaction zone. Application of the method provides for reduction of power consumption, simplification of process equipment and use of endothermic and exothermic conversion in process. EFFECT: higher efficiency. 2 cl, 1 dwg, 2 ex