DEVICE FOR DOSED SUPPLY OF CHEMICAL REAGENT Russian patent published in 2000 - IPC

FIELD: oil- and gas-producing industry, particularly, devices for dosed supply of liquid reagents to oil or gas pipeline or well. SUBSTANCE: device has vessel for reagent with hollow discharge reagent pipeline and gas accumulation chamber. There is gas pipeline with pressure differential stabilizer. The latter is made in the form of upper part of pipeline separated by partition with calibrated holes. Partition is installed for forced displacement. It may be displaced through distance ensuring constant column of regent. Hollow discharge reagent pipeline is made in the form of siphon. Installed in outlet part of siphon is partition with calibrated hole. Partition may be displaced by force. EFFECT: stabilized supply of reagent. 1 dwg