DEVICE FOR FORMING MULTILAYER STRUCTURES Russian patent published in 2001 - IPC

Abstract RU 2175692 C2

FIELD: technology of semiconductor materials and devices; for application of thin films of semiconductor joints and solid solutions on their base. SUBSTANCE: proposed device includes main quarts ampoules and two additional ampoules with whose help alloyed films are grown gaseous phases using two additional vapor sources: one with its own component and other with alloying admixture. Proposed device differs from prototype in availability of isolated chambers provided with holes where heaters may be located; main chamber has inner cavity with hole for placing the substrates. EFFECT: enhanced efficiency; increased productivity. 2 dwg

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RU 2 175 692 C2

Authors

Bestaev M.V.

Gatsoev K.A.

Gorelik A.I.

Degoev M.A.

Moshnikov V.A.

Tomaev V.V.

Dates

2001-11-10Published

1997-07-09Filed