FIELD: optical measurements. SUBSTANCE: invention specifically refers to measurement of distance from radiation object to point light source. Process determining distance to radiation source S0(S1) includes formation of image S1
0
(S1
1
) of radiation source with the use of optical system and matching of this image S1
0
(S1
1
) with dependence of response function of this optical system on distance to radiation source S0(S1) found in advance. In this case response of optical system is modified by means of amplitude-phase mask installed in path of rays which is formed with capability of deflection of these rays in direction mainly orthogonal to direction of deflection of rays caused by defocusing. Angle of turn of image S1
0
(S1
1
) of radiation source S1
0
(S1
1
) is evaluated by matching this image S0(S1) with specified response function. Optimally transmission coefficient of amplitude-phase mask should be set in the form of periodic function of angle of turn. In this case while evaluating angle of turn one determines change of phase of signal of formed image S1
0
(S1
1
) of radiation source S0(S1). EFFECT: increased accuracy and economy of measurements thanks to possibility of evaluation of distance to any point on surface of object and to reproduction of its form by single photograph of image of radiation object. 1 cl, 4 dwg _