FIELD: optics. SUBSTANCE: procedure measuring resolution limit of information-measurement optico-electron system is based on formation of image of line test object, on highlighting part of line test object and on determination of resolution limit. Image of line test object is formed on screen of computer monitor, range of elements of line test object with resolved and non-resolved groups of lines is allocated, groups of lines with equal filling factors are chosen, low-frequency spatial filtration of them is conducted with further determination of dependence of illuminance distribution on frequency of lines in images of chosen groups of lines. N-th element of line test object is found by obtained dependencies in all groups of which brightness falls-through are absent. Then size of line located in group of lines with maximal filling factor is established in (n-1)-th element of line test object and later resolution limit is found Line test object includes elements comprising groups of lines which frequency in element is same and rises with increase of element number and width of lines diminishes with increase of element number in geometric progression with denominator equal to 0.94. Each element is made up of three groups of twin lines. In first group of them filling factor is equal to 0.8 and size of line is chosen at will, in second group filling factor is equal to 0.6. EFFECT: increased measurement accuracy of resolution limit. 2 cl, 5 dwg
