FIELD: industrial organic synthesis. SUBSTANCE: tetrafluoromethane destined as etching and cleaning gas in manufacture of semiconductor devices is purified by way of interaction of tetrafluoromethane, polluted by one or several ethylene derivatives, one or several hydrocarbon compounds, carbon monoxide and/or carbon dioxide, with zeolite and/or carbon-containing adsorbent. Zeolite (MS-4A, MS-5A, MS-10X, or MCS-13X) is characterized by average pore size 3.4-11 and Si/Al ratio 1.5 or less and carbon-containing adsorbent, in particular molecular sieves 4A and/or carbon molecular sieves 5A, has average pore size 3.4-11 . Contact is effected in liquid phase. EFFECT: increased purity of product. 11 cl, 11 tbl, 9 ex
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