"SEWING WITHOUT MEASUREMENTS" METHOD FOR PLOTTING OF SKIRT STRAIGHT-CUTTING PATTERN Russian patent published in 2004 - IPC

FIELD: sewing industry.

SUBSTANCE: method involves providing anthropological measurements; determining cut aperture value measured in horizontal plane from imaginary vertical surfaces extending through protruding points of abdomen, hips, buttocks to waist line; correcting width of front and rear panels along waist line; amending width along waist and hip line, with coefficients defining extent of clinging of article to figure being taken into account; determining length of article; introducing buttocks center level measurement value L_b determined laterally of waist line downward and up to the level of most protruding buttocks point; determining precision of figure waist deflection depth measurement by formula of correspondence of difference of waist and buttocks semi-embrace and waist deflection depth: S_b-S_w=(D_b+D_h+D_a)±1 cm, where S_b is semi-embrace of buttocks; S_w is semi-embrace of waist; D_b is depth of buttocks; D_h is depth of hips; D_a is depth of abdomen. Hip line position is determined with buttocks center measurement level L_b taken into account. Position of cut leading part on waist of skirt front and rear panels is determined as projection of chest center on waist line. Length of cuts is selected depending on aperture extent thereof.

EFFECT: increased precision of pattern plotting and increased extent of clinging of article to figure.

3 cl, 10 dwg, 2 tbl