FIELD: plasma and high-power ion beam generation.
SUBSTANCE: ion source has hollow cathode, igniter electrode, anode grid disposed opposite output aperture of hollow cathode, screen grid electrically connected to anode grid, and main hollow anode with magnetic system mounted on its surface. Gas is admitted to cathode space. Voltage applied between cathode and igniter electrode strikes glow discharge, electrons from its plasma run through anode grid, arrive at main anode space, and are additionally accelerated due to potential difference applied between grid and main anode. Peripheral magnetic field holds injected electrons in main anode space thereby affording generation of dense and uniform plasma in space free from magnetic field. Ions are taken off plasma through holes in screen electrode.
EFFECT: enhanced efficiency at high uniformity of emitting plasma, simplified design, enhanced reliability and service life of ion source.
1 cl, 1 dwg
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Authors
Dates
2004-11-20—Published
2003-06-02—Filed