METHOD AND DEVICE FOR SATURATING GAS WITH VAPOR OF LIQUID Russian patent published in 2004 - IPC

FIELD: measuring engineering.

SUBSTANCE: method includes the transport of the liquid vapor by gas which passes through the saturation chamber. The flow rate of the vapor is controlled by changing the ratio between the molecular and turbulent diffusion. The device has thermally controlled saturation chamber partially filled with liquid, device for inflowing the liquid, and device for supplying the gas, provided with the connecting pipe for inflowing gas. One side of the L-shaped baffle is perpendicular to the direction of the gas flow. The face of the second side is connected with the housing of the saturation chamber above the branch pipe for supplying gas. The device is also provided with a device for the control of the concentration of the vapor-gas mixture, which consists of gate mounted in the saturation chamber for reciprocation over the vertical by sealed rod along the L-shaped baffle in the guiding grooves of the saturation chamber.

EFFECT: enhanced efficiency.

2 cl, 1 dwg