FIELD: technology for burning plant growth refuse in pseudo-liquefied layer.
SUBSTANCE: method includes setting up recirculation of hard heat carrier, mixing refuse with recirculation agent, drying and burning the latter in pseudo-liquefied layer. Recirculation coefficient K is determined from value of necessary drying in accordance to formula K = r(W1 - W2)/[(T1 - T2)C(100 - W2)], and temperature of pseudo-liquefied layer is additionally adjusted by feeding drying steams to above-layer hollow, also, refuse is dried until, at least, free moisture is removed. Device for burning refuse in pseudo-liquefied layer has combustion chamber with pseudo-liquefied layer, above-layer hollow, drying chamber, capacitor, steam duct, system for recirculation of hard heat carrier, drying chamber by steam duct is connected to above-layer hollow with possible adjustable feeding of steam thereto from drying of refuse.
EFFECT: higher efficiency of burning of wet refuse.
2 cl, 1 dwg
