TRANSPARENT SUBSTRATE WITH LAYER OF SILICON DERIVATIVE Russian patent published in 2006 - IPC C03C17/23 C03C17/34 

Abstract RU 2269494 C2

FIELD: technology of application of layers of interference thickness on transparent substrates for obtaining specific functional properties.

SUBSTANCE: transparent glass substrate has layer on one of its surfaces which possesses hydrophilic properties on base of at least partially oxidized silicon derivative selected from silicon oxides at content of oxygen below stoichiometric level, silicon oxycarbide or oxynitride or containing additive of metal in insignificant amount relative to silicon.

EFFECT: facilitated procedure; reduction of condensation of water vapor on substrate surfaces.

24 cl, 3 dwg, 5 tbl, 11 ex

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RU 2 269 494 C2

Authors

Tal'Paer Ksav'E

Simone Mishel'

Azzopardi Mari-Zhoze

Djurando Ann

Dates

2006-02-10Published

2000-10-31Filed