FIELD: new engraving pastes for silicon oxide and silicon nitride glass; production of the new engraving pastes free from impurities used for inorganic surfaces.
SUBSTANCE: the invention is pertaining to the new engraving pastes in the form of typed, homogeneous, impurities free and possessing a non-Newtonian flow pattern for engraving of the inorganic surfaces, in particular, of glass, preferably the glass grounded on silicon oxide and silicon nitride, and other systems based on silicon oxide and silicon nitride and also on their layers. The typed engraving agent represents the homogeneous, free from particles-impurities engraving paste, which includes: at least one engraving component for the inorganic surfaces, a dissolvent, a thickener, and if it is necessary - organic and-or inorganic acid (acids), if necessary, additives such as the defoaming agents, thixotropic agents, the agents for the check of the flow, the deaeration agents and the adhesion promoters, which are effective even at the temperatures from 15 up to 50°C and-or activated, if necessary, by power supply. As the thickener the engraving paste includes cellulose and derivatives of the cellulose, amylum or derivatives of the amylum and-or the polymetric compounds based on acrylate or the functionalized vinyl links in the shares (in mass %): from 0.5 up to 25 mass %, preferably from 3 up to 20 mass %in respect to the total mass of the engraving paste. The method of engraving provides for application on the inorganic surface of the engraving indicated paste with the following its flushing away by the dissolvent.
EFFECT: the invention allows to apply engravings on the inorganic surfaces, mainly, the glass grounded on silicon oxide and silicon nitride, and other systems based on silicon oxide and silicon nitride and also on their layers.
11 cl, 4 ex
