MICROWAVES PLASMATRON Russian patent published in 2008 - IPC H05H1/24 

Abstract RU 2328095 C2

FIELD: plasma technology.

SUBSTANCE: invention relates to the plasma technology, particularly to the plasma generating devices with the use of the microwaves fields, and can be used in lighting the dust fuel and water-carbon suspensions, plasma arc cutting and casting, and other technologic applications. Plasmatron contains a magnetron and the cylindrical resonator with the perforations in its butt walls; in one of which the magnetron antenna is installed, and another one is supplied with the nozzle and serves as am output for the plasma torch. In the middle of the resonator cavity, two partitions made of dielectric material, are installed; one of the partitions is gas-permeable, and in the centre of another one there is a hole. Into the cavity between the resonator butt wall and gas-permeable partition, the magnetron antenna is inserted, and the cavity is filled with the electroisolating high pressured gas. Two other cavities are connected to the plasma generating gas input system, and gas is injected into the cavity between the second resonator butt wall and the holed partition, tangentially to the forming resonator circumference.

EFFECT: stability and resistance of plasma torch, reliability and efficiency of plasmatron are increased.

1 dwg

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RU 2 328 095 C2

Authors

Burov Vladimir Fedorovich

Dates

2008-06-27Published

2006-06-23Filed