MICROWAVE PLASMATRON Russian patent published in 2020 - IPC H05H1/26 H05H1/46 

FIELD: plasma technology.

SUBSTANCE: invention relates to plasma engineering, in particular to devices for generating plasma using external electromagnetic fields of ultrahigh frequency, and can be used for carrying out plasma-chemical and thermal processes, as well as for plasma treatment of various materials and articles. Microwave plasmatron comprises a microwave generator connected through a main rectangular waveguide to a waveguide type plasmatron at wave H₁₀, which comprises rectangular waveguide of plasmatron and dielectric discharge tube located perpendicular to wide wall of this waveguide and passing through its middle, and discharge chamber connected to it. Device is equipped with second additional waveguide, and between the microwave generator and the discharge chamber there is a three-decibel quadrature bridge in the form of a directional coupler of a loop type with a coupling along a wide wall of the waveguide, wherein a first plasmatron waveguide is connected to the first output arm of the bridge, and a second additional plasmatron waveguide is connected to the second output arm of the bridge, wherein the discharge chamber is common for them, in addition, both the plasmatron waveguide made in the form of short-line segments so that the axis of the discharge chamber spaced from the shorted end of the waveguide at a distance of a multiple of an odd number λ_w/4, and a bridge arm, isolated from the input port, a coherent waveguide load.

EFFECT: high reliability of operation of the device owing to the fact that the microwave generator, irrespective of the presence or absence of microwave plasma discharge, as well as the degree of its matching with the supplying electromagnetic wave, operates for a matched load.

1 cl, 1 dwg