FIELD: electric engineering.
SUBSTANCE: in method of photo-template stocks production that includes mechanical processing of glass plates with application of polishing powder on the basis of cerium dioxide and polishing cloth made of nonwoven material, which consists of working and adhered layer, treatment in water solutions of organic acids, treatment in neutral water medium, application of masking layer and resist, additionally between working and adhered layers of polishing cloth internal reinforcing layer is formed with the following ratio of thicknesses: adhered layer - reinforcing layer - working layer 2.0-2.5:1:1.5-2.0.
EFFECT: method allows to increase output of proper photo-template stocks by improvement of polishing cloth structure during polishing of glass plates by formation of additional reinforcing layer between polishing and adhered layers.
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Title | Year | Author | Number |
---|---|---|---|
METHOD FOR PRODUCING PHOTOMASK BLANKS | 2005 |
|
RU2307423C2 |
METHOD FOR PRODUCING MASK TEMPLATES | 2005 |
|
RU2308179C1 |
METHOD FOR PRODUCING MASK TEMPLATES | 2005 |
|
RU2305918C2 |
METHOD FOR PRODUCING PHOTOMASK BLANKS | 2004 |
|
RU2260873C1 |
METHOD FOR PRODUCING PHOTOMASK BLANK | 2004 |
|
RU2274925C1 |
METHOD FOR MAKING PHOTO-TEMPLATE BLANKS | 2005 |
|
RU2292679C2 |
PROCESS OF PRODUCTION OF MASK WORKSTOCKS | 2001 |
|
RU2208920C1 |
METHOD FOR PRODUCING PHOTO-TEMPLATE BODIES | 2004 |
|
RU2269213C1 |
APPARATUS FOR WORKING GLASS BLANKS FOR PHOTO MASKS | 0 |
|
SU952617A1 |
METHOD OF PRODUCING SUSPENSION FOR POLISHING GLASS PLATES | 0 |
|
SU1420933A1 |
Authors
Dates
2008-07-20—Published
2006-09-27—Filed