FIELD: micro-electronics, in particular, method for producing mask templates.
SUBSTANCE: for increasing adhesion of photoresists to masking layers of chromium and iron oxide, 2-3% mass. Of leucoparafuchsin (amine derivative of tritane), which allows, after appropriate thermal processing, to improve precision of reproduction of critical elements of integration circuit, undercutting below resist film not exceeding 0,1 micrometers to the side.
EFFECT: increased efficiency.
2 cl, 1 tbl
| Title | Year | Author | Number |
|---|---|---|---|
| METHOD FOR PRODUCING PHOTOMASK BLANKS | 2005 |
|
RU2307423C2 |
| METHOD OF PHOTO-TEMPLATE STOCKS PRODUCTION | 2006 |
|
RU2329565C1 |
| METHOD FOR PRODUCING MASK TEMPLATES | 2005 |
|
RU2308179C1 |
| METHOD FOR MAKING PHOTO-TEMPLATE BLANKS | 2005 |
|
RU2292679C2 |
| METHOD FOR PRODUCING PHOTOMASK BLANK | 2004 |
|
RU2274925C1 |
| METHOD FOR PRODUCING PHOTOMASK BLANKS | 2004 |
|
RU2319189C2 |
| PROCESS OF PRODUCTION OF MASK WORKSTOCKS | 2001 |
|
RU2208920C1 |
| METHOD FOR PRODUCING PHOTOMASK BLANKS | 2004 |
|
RU2260873C1 |
| MASKBLANK | 2002 |
|
RU2206115C1 |
| METHOD FOR PRODUCING PHOTO-TEMPLATE BODIES | 2004 |
|
RU2269213C1 |
