FIELD: micro-electronics, in particular, method for making photo-template blanks.
SUBSTANCE: method includes preparation of masking layer of iron oxide in alkali oxidizing compound, containing hypochlorite, while maintaining their constant concentration, thus making it possible to execute surface preparation process with etching of surface-adjacent layer due to generation of atomic oxygen during decomposition of hypochlorite to following operation of applying resist.
EFFECT: increased efficiency of washing off of masking layers based on iron oxide.
2 cl, 1 tbl
| Title | Year | Author | Number |
|---|---|---|---|
| METHOD FOR PRODUCING MASK TEMPLATES | 2005 |
|
RU2308179C1 |
| METHOD FOR PRODUCING MASK TEMPLATES | 2005 |
|
RU2305918C2 |
| PROCESS OF PRODUCTION OF MASK WORKSTOCKS | 2001 |
|
RU2208920C1 |
| METHOD OF PHOTO-TEMPLATE STOCKS PRODUCTION | 2006 |
|
RU2329565C1 |
| METHOD FOR PRODUCING PHOTOMASK BLANKS | 2005 |
|
RU2307423C2 |
| METHOD FOR PRODUCING PHOTOMASK BLANKS | 2004 |
|
RU2319189C2 |
| METHOD FOR PRODUCING PHOTO-TEMPLATE BODIES | 2004 |
|
RU2269213C1 |
| METHOD FOR PRODUCING PHOTOMASK BLANK | 2004 |
|
RU2274925C1 |
| METHOD FOR PRODUCING PHOTOMASK BLANKS | 2004 |
|
RU2260873C1 |
| MASK AND METHOD OF MANUFACTURING THEREOF | 0 |
|
SU938338A1 |
