FIELD: technological processes.
SUBSTANCE: according to claim, at least one first transparent dielectric layer is applied, followed by functional layer based on material reflecting infrared radiation. Then the first protection layer of material with less than 1.9 electronegativity difference from oxygen and thickness under 3 nm is applied, followed by the second protection layer with less than 1.4 electronegativity difference from oxygen and thickness under 7 nm. Further at least one second transparent dielectric layer is applied. The invention is especially suitable for forming of glass cover elements with low radiation rate or for sun protection, which are to be bent after glass cover application.
EFFECT: improved glass cover quality.
28 cl, 5 ex
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