MANUFACTURING METHOD FOR FILM RESISTORS Russian patent published in 2008 - IPC H01C17/24 

Abstract RU 2339104 C1

FIELD: electricity.

SUBSTANCE: invention is attributed to the field of electricity, specifically to radioelectrinics and can be used in manufacturing of hybrid integrated circuits. Method for film resistors manufacturing includes resistance bringing up to nominal value by cutting with laser beam the slot in film resistor preliminary coated with negative photoresist layer upon which laser cutting of film resistor is made. Then side faces of slot and photoresist layer with deposited on it fume products of laser cutting are covered with isolating layer of positive photoresist.

EFFECT: quality improvement and labor consumption reduction.

2 dwg, 1 tbl

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RU 2 339 104 C1

Authors

Krjuchatov Vladimir Ivanovich

Dates

2008-11-20Published

2007-03-16Filed