FIELD: chemistry.
SUBSTANCE: process of hydrogen reduction of trichlorosilane is carried out on heated silicon rods of bases 5. Supply of trichlorosilane to the reactor is then blocked and a filtered mixture of tetrachlorosilane and polysilanechloride are supplied to the inlet nozzle 3 in the cover of reactor 1. A specific flow rate of hydrogen is set. In the reactor the decomposition process of polysilanechloride with simultaneous hydrogenation of the products of decomposition and tetrachlorosilane takes place. As a result of this trichlorosilane is formed, restored on the rod-bases 5 with hydrogen to silicon.
EFFECT: possibility of apart from carrying out the main process to additionally process the waste of high-boiling chlorosilane and silicon tetrachloride.
1 dwg
Title | Year | Author | Number |
---|---|---|---|
METHOD OF OBTAINING POLYCRYSTALLINE SILICON | 2007 |
|
RU2342320C2 |
METHOD OF PROCESSING STILLAGE RESIDUE CONTAINING POLYSILANECHLORIDE | 2007 |
|
RU2341455C1 |
POLYCRYSTALLINE SILICON PROCESS | 2007 |
|
RU2357923C2 |
METHOD OF PRODUCING POLYCRYSTALLINE SILICON | 2011 |
|
RU2475451C1 |
METHOD OF PRODUCTION OF POLYCRYSTALLINE SILICON | 2004 |
|
RU2278075C2 |
METHOD FOR CLEANING OF INTERNAL SURFACES OF SILICON HYDROGEN RESTORATION PLANTS FROM POLYSILANECHLORIDES | 2007 |
|
RU2341454C1 |
METHOD OF OBTAINING POLYCRYSTALLINE SILICON | 2018 |
|
RU2674955C1 |
METHOD OF PRODUCTION 0F TRICHLOROSILANE | 2004 |
|
RU2280010C1 |
METHOD OF REMOVAL OF POLYSILANE CHLORIDES FROM STEAM-GAS MIXTURE DISCHARGED FROM INSTALLATIONS OF HYDROGEN REDUCTION OF SILICON AND DEVICE FOR ITS REALISATION | 2007 |
|
RU2344993C1 |
POLYCRYSTALLINE SILICON PRODUCTION PROCESS | 1998 |
|
RU2136590C1 |
Authors
Dates
2008-12-20—Published
2007-03-23—Filed