METHOD OF REMOVAL OF POLYSILANE CHLORIDES FROM STEAM-GAS MIXTURE DISCHARGED FROM INSTALLATIONS OF HYDROGEN REDUCTION OF SILICON AND DEVICE FOR ITS REALISATION Russian patent published in 2009 - IPC C01B33/107 

FIELD: chemistry.

SUBSTANCE: steam-gas mixture, discharged from installations of hydrogen reduction of silicon, is condensed and divided into two flows. Flow condensed at temperature minus 95÷105°C is directed to obtain polycrystalline silicon. Flow condensed at temperature minus 10÷12°C is directed to capacity and is bubbled through layer of liquid chlorosilanes. Temperature of liquid phase during bubbling with steam-gas mixture is supported within the range minus 5 ÷ plus 5°C. Device for polysilanechlorides removal contains body 1 with spherical side walls, branch pipe for receiving condensate 6 and branch pipe for steam-gas mixture removal 10. In side wall of body branch pipe 7 of condensate overflow is installed. On the capacity bottom gas-distributing device 4, connected with branch pipe 3 for steam-gas mixture supply, is installed. At the bottom of gas-distributing device 4 holes 5 are made, their pass-through section is equal pass-through section of branch pipe 3 of steam-gas mixture.

EFFECT: continuous removal of polysilane chlorides from steam-gas mixture discharged from installations of hydrogen reduction.

2 cl, 2 dwg