METHOD OF OBTAINING ELECTRON BEAM AND DEVICE TO THIS END (VERSONS) Russian patent published in 2008 - IPC H01J33/04 

Abstract RU 2341846 C1

FIELD: physics.

SUBSTANCE: proposed method of obtaining an electron beam involves applying supply voltage between a cathode with a cavity and an anode. A high-voltage discharge is initiated in a gas-discharge cell. A plasma forms in the cavity of the cathode, which provides for emission of electrons, accelerated by the strong field of the high-voltage discharge. The formed plasma has low density, for which purpose the surface of the cathode cavity is made from a dielectric. The generated electron beam can also be used as an auxiliary electron beam, which is directed over the surface of the open part of the cathode with a cavity. At the open part of the cathode on the side of the anode, a high-current electron beam is then formed. The device for generating an electron beam comprises an anode and a hollow cathode with an opening on the walls, which is located near the anode, all put into a gas-discharge cell. The wall of the hollow cathode with an opening is made from a dielectric sheet with an opening. The high-voltage power supply is connected to the anode and cathode.

EFFECT: provision for operation of sources under high pressure.

3 cl, 7 dwg

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RU 2 341 846 C1

Authors

Sorokin Aleksandr Razumnikovich

Dates

2008-12-20Published

2007-05-10Filed