PULSED ELECTRON-BEAM GAS-DISCHARGE SOURCE (ALTERNATIVES) Russian patent published in 2004 - IPC

FIELD: physical and quantum electronics, roentgen engineering, spectroscopy, plasmochemistry, and diagnostic measurements.

SUBSTANCE: proposed pulsed gas-discharge electron-beam source has cathode whose effective surface mounts dielectric plate, gauze anode, electron-beam drift region past gauze cathode, all mounted in gas-discharge chamber, and switch-mode high-voltage power supply connected to cathode and gauze anode; the latter being disposed directly on dielectric plate surface. As an alternative, gas-discharge chamber accommodates additional electrode, and distance between gauze anode and additional electrode is chosen to ensure that electrical breakdown voltage between them will afford desired operating voltage range of device; switch-mode power supply is connected here to cathode and additional electrode. Proposed device incorporates provision for hindering open barrier discharge and for maintaining its stability thereby enlarging its operating pressure range by more than order of magnitude.

EFFECT: enlarged operating pressure range.

2 cl, 6 dwg