METHOD FOR PRODUCING ELECTRON BEAM (ALTERNATIVES) Russian patent published in 2004 - IPC

FIELD: electronics. SUBSTANCE: method that can be used for developing electronic devices, lasers, for plasma chemistry, spectroscopy, material treatment, electron-beam welding, and diagnostic measurements involves acceleration of electron beam in continuous or pulsed mode of high-voltage discharge in discharge gap between cathode and anode within gas-filled discharge chamber and its extraction through anode holes, supply of photoeffect-causing light flux to cathode from radiation source external relative to discharge gap during high-voltage discharge; in the process, when voltage is increased, gas pressure in discharge chamber is reduced, drift space past anode being used as radiation source external relative to discharge gap; elongated area with low potential gradient is generated near cathode and use is made of insert with electron-accelerating dielectric channels within discharge chamber between elongated area with low potential gradient and anode; used as anode is flat strip with drilled holes. Continuously supplied voltage ranges between 1.5 and 10 kV and respective pressure is 6 to 12 T. Pulsed-mode voltage varies between 1.5 and 10 kV and respective pressure is 8 to 16 T. EFFECT: enhanced effectiveness of electron beam generation; extended service life of cathode. 4 cl, 2 dwg, 6 ex