ELECTRON BEAM GENERATION METHOD AND DEVICE FOR REALISING SAID METHOD (VERSIONS) Russian patent published in 2010 - IPC H01J33/02 

Abstract RU 2383079 C1

FIELD: physics.

SUBSTANCE: invention relates to electronics and can be used in physical electronics, quantum electronics, plasma chemistry and diagnostic measurements. The method of making an electron beam involves igniting high-voltage discharge in a gas-discharge cell by applying power supply voltage between a cathode and an anode. Additional flow of ions is provided in the space between the cathode and the anode, which provides additional ionisation of gas with an auxiliary electron beam whose electrons are accelerated in the strong field of the high-voltage discharge. The auxiliary electron beam is generated on the perimetre of the cathode surface on the inner wall of an annular electrode. The device for generating an electron beam has a cathode and an anode placed in a gas-discharge cell, and a high-voltage power supply which is connected to the cathode and the anode. On the inner surface of the cathode there is an annular electrode on the inner wall of which an auxiliary electron beam is generated. In order to reduce discharge current, the flat part of the annular electrode on the anode side is covered by a dielectric plate with an opening whose diametre coincides with the inner diametre of the annular electrode.

EFFECT: wider operating pressure range of gas, as well as provision for high discharge stability with respect to sparking.

5 cl, 7 dwg

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RU 2 383 079 C1

Authors

Sorokin Aleksandr Razumnikovich

Dates

2010-02-27Published

2008-12-01Filed