PLASMA CHEMOTRONIC METHOD OF OBTAINING OXYGEN-CONTAINING VAPOUR-GAS MIXTURE Russian patent published in 2009 - IPC C25B1/30 C25B1/04 C02F1/46 

FIELD: chemistry.

SUBSTANCE: invention relates to physico-chemical technologies and technology of water solutions. Plasma chemotronic method of obtaining oxygen-containing vapour-gas mixture includes passing asymmetric in density rectified electric current between perforated anode located in lower base of inter-electrode continuous chamber and rod cathode located in upper base of inter-electrode continuous chamber with simultaneous forcing of saturated with oxygen, acidified or alkalified de-ionized water through perforated anode into inter-electrode chamber. Method is carried out in stable volumetric ball chemotronic plasma, spontaneously arising between anode and cathode in electrified gas-liquid flow of de-ionized water with concentration of ions H₃O⁺ or OH^-, which does not exceed 0.2 M, with operation voltage in electro-chemical circuit of plasmochemotrone from 400±5 to 280±3 Volts.

EFFECT: increase of vapour-gas mixture output, reduction of energy consumption.

6 dwg, 3 tbl