PLASMOCHEMOTRONIC METHOD FOR MAKING VAPOR-GAS MIXTURE HO+O Russian patent published in 2001 - IPC

Abstract RU 2171863 C2

FIELD: systems for processing solutions by physicochemical and electrochemical procedures. SUBSTANCE: method comprises steps of passing rectified electric current with asymmetrical density between anode and rod-type cathode; simultaneously pressing through apertured anode and hollow cathode (providing gas-liquid mixture in interelectrode chamber) acidified or alkalized aqueous solution of electrolyte. At such condition when potentials in interelectrode chamber are in range from 220+-10V until 140+-5 V, chemotronic plasma is generated spontaneously in near-cathode space. In such plasma at temperature of solution at outlet of reactor in range (70-98)C, synthesis of vapor-gas mixture H2O2+O2 occurs with energy yield almost equal to theoretically possible. EFFECT: increased energy yield of vapor-gas mixture, lowered power consumption for synthesis of desired products, necessary ecological properties of synthesis products. 4cl, 1 dwg, 4 tbl

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RU 2 171 863 C2

Authors

Zykov E.D.

Shcherbak V.N.

Dates

2001-08-10Published

1998-07-30Filed