PULSE-PERIODIC PLASMATRON Russian patent published in 2009 - IPC H05H1/26 B23K10/00 

Abstract RU 2343651 C1

FIELD: physics.

SUBSTANCE: present invention pertains to plasma technology and can be used for making sources of high-intensity plasma streams for modifying surface properties of materials and coatings. Pulse-periodic plasmatron comprises power supply unit and discharge device, comprising series-connected unit for generating and inputting plasma and accelerator channel. The accelerator channel is in form of cylindrical or cone shaped anode and cathode, arranged coaxially and connected to the power supply. The power supply is pulsed and the unit for generating and inputting plasma is in form of a continuous operation plamatron fitted in the blind end face of the accelerator channel. The outlet of the plasmatron is connected to the accelerator channel through an expansion nozzle.

EFFECT: design of plasmatron with high frequency (up to 100 Hz) of generating pulsed plasma streams, working at normal pressure, providing for low noise levels during operation, and hence improving working conditions during plasma modification of properties of materials and coatings.

1 dwg

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RU 2 343 651 C1

Authors

Chivel' Jurij Aleksandrovich

Min'Ko Dmitrij Vatslavovich

Kuznechik Oleg Ol'Gerdovich

Nikonchuk Irina Stepanovna

Dates

2009-01-10Published

2007-06-13Filed