LOW-ENERGY ION BEAMS SOURCE FOR NANO ELECTRONICS TECHNOLOGIES Russian patent published in 2009 - IPC H01J27/24 

FIELD: electrical engineering.

SUBSTANCE: invention relates to ion-beam engineering and may be used as a key element of the existing and brand-new industrial technologies of nano electronics. Low energy ion beam source includes supersonic de Laval nozzle with tube on its axis. The rod-like (or wire-like) target is supplied to the supersonic expanding part where laser beam focused to the target end evaporates and ionises the target material. The specific feature of the claimed source is an electro magnetic ion cone, installed on nozzle axis and behind outlet shearing. The electro magnetic ion cone is intended for generating and focusing ion beam and for cleaning from the blanketing gas leaking from the nozzle by pumping.

EFFECT: positive effect is achieved due to source operation and provides for increasing uninterrupted source operation period, decreasing target material losses, consumption of blanketing gas and source dimensions and decreasing cost.

2 cl, 9 dwg