FIELD: materials engineering.
SUBSTANCE: invention relates to methods for treating the surface of various materials using bombardment with an intense flow of gas particles (molecules and small clusters) with low specific kinetic energy. In the method, the flow is formed by fragmentation of accelerated gas cluster ions on background gas particles in a small volume directly in front of the target. In this case, the background is created as a result of scattering of the cluster beam itself on the target. The length of the gas cell is selected in such a way that the product of the background gas pressure and the length of the beam trajectory from the entrance to the gas cell to the target is at least 5×10-4 torr × cm.
EFFECT: improved efficiency and productivity of materials processing by increasing the intensity of the beam of gas particles (molecules and small clusters) reaching the target surface.
1cl, 3 dwg
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